搜索结果: 1-7 共查到“工学 magnetron sputtering”相关记录7条 . 查询时间(0.06 秒)
氩氢体积比对磁控溅射制备AlxOy/PET阻隔膜的影响（Characterization of AlxOy Barrier Films on PET Substrate Prepared by Magnetron Sputtering）
AlxOy/ PET 磁控溅射 阻隔性 力学性能
2010/12/28
采用直流电源，以纯铝为靶，氧气为反应气体，高纯氩气为溅射气体磁控溅射在PET基底上制备高阻隔性AlxOy/PET包装薄膜，并研究不同氩氢体积比对AlxOy薄膜形貌、成分、结构的影响，讨论了镀AlxOy膜后DET力学性能与阻隔性能的变化。FTIR与XPS研究分析表明，反应氧气量直接影响AlxOy薄膜的化学结构，薄膜的红外光谱的峰值、强度和带宽等变化规律均与氧气量有关，并且AlxOy中氧原子的含量...
Structural, electrical and optical properties of AZO/SiO2/p-Si SIS heterojunction prepared by magnetron sputtering
Al-doped ZnO sputtering SIS heterojunction current–voltage (I–V ) characteristics
2009/6/22
ZnO thin films doped with aluminum (AZO) were deposited on silicon dioxide covered type
texturized Si substrates by radio frequency magnetron sputtering, to fabricate AZO/SiO2/p-Si
heterojunction, a...
Study of structural and optical properties of TiO2:Tb thin films prepared by high energy reactive magnetron sputtering method
TiO2 magnetron sputtering Tb
2009/4/11
This work is focused on structural and optical properties of TiO2 thin films doped with different amount of terbium. The thin films have been prepared by high energy reactive magnetron sputtering (HE ...
Properties of AlNx thin films prepared by DC reactive magnetron sputtering
aluminum nitride (AlN) thin films
2009/4/10
In this paper, the results of investigation of the influence of cathode current on optical and dielectric AlNx thin-film properties are presented. AlNx films were prepared by pulsed DC reactive magnet...
Stable superhydrophobic surface: fabrication of interstitial cottonlike structure of copper nanocrystals by magnetron sputtering
superhydrophobic copper film magnetron sputtering nanostructure wettability
2008/6/12
A stable superhydrophobic copper surface was obtained by radio-frequency magnetic
sputtering on Si (100) and quartz substrates. The water contact angle and sliding angle of the
superhydrophobic copp...
Electrical resistivity of copper oxide thin films prepared by reactive magnetron sputtering
Electrical properties Magnetron sputtering Thin films
2007/9/30
Purpose: Investigation the effect of varying r.f. power and oxygen flow rates during deposition on the electrical properties of copper oxide thin films prepared by reactive magnetron sputtering Design...
Optical emission from Eu, Tb, Nd luminescence centers in TiO2 prepared by magnetron sputtering
luminescence rare earth elements
2007/4/4
This work presents the results of optical emission from Eu3+, Tb3+ and Nd3+ luminescence centers in TiO2 thin films. Thin films were prepared by magnetron sputtering from metallic Ti-Eu, Ti-Tb, Ti-Nd ...